The Program 2025
High-profile researchers in the field of HiPIMS has been invited.
They will give oral presentations.
You will be able to interaction with
the speakers, exhibitors, and breakout room presenters as with all participants of the workshop.
* Please note that the time schedule of Day 2 is different from Day 1 and 3.
Time zones
Europe: CET: UTC +1
North America: PST: UTC-8, CST: UTC-6, EST: UTC-5,
Asia: CST: UTC+8, JST: UTC+9
Color codes of the categories
Plasma
Modeling & simulations
Processes
Films
Applications
March 17, 2025
6:00～11:30 UTC
March 18, 2025
12:00～17:30 UTC
March 19, 2025
6:00～11:30 UTC
6:50 - 7:00 UTC
Opening of the workshop
7:00 - 7:20 UTC
Pavel Soucek
Masaryk University, Czech Republic
Deposition of refractory metal-based high entropy (CrHfMoTaW)xNy nitrides enabled by HiPIMS
7:20 -7:40 UTC
Koichi Takaki
Iwate University, Japan
Production of High-Density Plasma by 150 kHz Band Burst Pulse for One-Inch Etching Process
7:40 - 7:50 UTC
Thomas Schütte
PLASUS GmbH,
Germany
EMICON FS - Tailoring HIPIMS pulses on the fly by spectroscopic pulse-resolved monitoring
7:50 - 8:00 UTC
Radek Zemlicka
Evatec, Switzerland
Advancing Process Control in Reactive HiPIMS: Exploring Challenges and Developing Novel Solutions for Large-Area Targets
13:00 -13:20 UTC
Diederik Depla
Ghent University, Belgium
Alex in wonderland:
reactive HiPIMS from a DC perspective
13:20 -13:40 UTC
Caroline Adam
Melec GmbH, Germany/ Keil University, Germany
Novel superimposed HiPIMS/RF sputtering process on a single magnetron
13:40 -13:50 UTC
Denis Kurapov
Oerlikon Balzers Coating Germany GmbH, Germany
Beyond HIPIMS – smooth, defect free coating for demanding applications
13:50 - 14:00
Lara Maroto-Diaz
Gencoa Ltd.,
UK
Optimization of reactive HiPIMS sputtering for hard coatings application
7:00 -7:20 UTC
Ju-Liang He
Feng Chia University, Taiwan
Heterogrown Graphene on Silicon for Enhanced Thermal Spreading
7:20 -7:40 UTC
Anna Kapran
Institute of Physics (FZÚ), Czech Republic/ aboratoire de Physique des Gaz et Plasmas (LPGP), Université Paris Saclay, France
Plasma Diagnostics by Means of a Magnetized QCM Probe (m-QCM) in HiPIMS Deposition Processes
7:40 - 8:00 UTC
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Sanath Kumar Honnali
Linköping University, Sweden
Low temperature epitaxial growth of compositionally complex films on insulating substrates by HiPIMS
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9:00 - 9:20 UTC
Sven Ulrich
Karlsruhe Institute of Technology (KIT), Germany
Carbon-based HiPIMS nanocomposite coatings
9:20 - 9:40 UTC
Ferenc Tasnadi
Linköping University, Sweden
HADB: a materials-property database for hard-coating alloys
9:40 - 10:00 UTC
Alexander Vahl
Kiel University, Germany
Early-stage noble metal growth on SiO2 and polymer surfaces – Comparison of DC magnetron sputtering and high-power impulse magnetron sputtering (HiPIMS)
15:00 - 15:20 UTC
Rainer Hippler
Institute of Physics of the Czech Academy of Sciences, Czech Republic
Pulse length and pulse period dependence of a reactive high power impulse magnetron (HiPIMS) discharge.
15:20 - 15:40 UTC
Kateryna Barynova
University of Iceland, Iceland
On the connection between back-attraction probability and sputter yield in HiPIMS
15:40 - 16:00 UTC
Matjaz Panjan
Jožef Stefan Institute, Slovenia
Insights into plasma evolution of individual HiPIMS pulses
9:00 - 9:20 UTC
Zhengtao Wu
Guangdong University of Technology, China
Fabrication of HiPIMS films for Ti alloy machining
9:20 - 9:40 UTC
Jiri Capek
University of West Bohemia, Czech Republic
On unipolar and bipolar HiPIMS pulse configurations to enhance energy flux to insulating surfaces
9:40 - 10:00 UTC
Oleksandr Pshyk
Empa, Switzerland
Low-temperature PVD with HiPIMS: from hard coatings to functional thin films
10:00 - 10:10 UTC
Closing of the workshop
Breakout room
presentations list
Day 1
(3/17)
Mingyue Han - Beihang University, China
“Investigation of plasma decay in BP-HiPIMS discharges”
Anna W. Oniszczuk - TRUMPF Hüttinger, Poland
“Study of the Cu plasma in HIPIMS Discharge”
Day 2
(3/18)
Jörg Vetter- S3 Consulting, Germany
“Characteristics of high power density DC magnetron sputtering (Hpd-DCMS): HiPIMS and “Others”?”
Zdenek Hubicka - Academy of Science of the Czech Republic, Czech Republic
“The RF ion plasma probe for pulsed plasma diagnostics”
Day 3
(3/19)
Joshua Chen - Tokyo Metropolitan University, Japan
“Peak current evolution in reactive multi-pulse HiPIMS of vanadium in Ar/O2”